ComputLitho - an indigenous optical lithography simulator with novel features

Abstract

This paper introduces a new optical lithography simulator, ComputLitho, that leverages the advanced algorithms and computational techniques to model the complex process of lithography, providing unprecedented insights into the mask corrections. This innovative tool enables prediction and optimization of lithographic processes with a very high precision, thereby facilitating mask corrections for accelerating process development and yield ramp in semiconductor device manufacturing. ComputLitho’s userfriendly interface and robust performance make it an invaluable resource for researchers and engineers in semiconductor industry.