Device design of step field plate RF LDMOS transistor for improved power amplifier applications

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dc.contributor.author Patel, Rutu
dc.contributor.author Maheshwari, Om
dc.contributor.author Mohapatra, Nihar Ranjan
dc.contributor.other 8th IEEE Electron Devices Technology and Manufacturing Conference (EDTM 2024)
dc.coverage.spatial India
dc.date.accessioned 2024-05-16T14:32:40Z
dc.date.available 2024-05-16T14:32:40Z
dc.date.issued 2024-03-03
dc.identifier.citation Patel, Rutu; Maheshwari, Om and Mohapatra, Nihar Ranjan, "Device design of step field plate RF LDMOS transistor for improved power amplifier applications", in the 8th IEEE Electron Devices Technology and Manufacturing Conference (EDTM 2024), Bangalore, IN, Mar. 03-06, 2024.
dc.identifier.uri https://doi.org/10.1109/EDTM58488.2024.10511850
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/10055
dc.description.abstract This work discusses the optimization of a Step Field Plate (SFP) RF LDMOS transistor to enhance Power Amplifier (PA) performance. The impact of structural parameters: length of overlap between gate and P-well mask (Lw), between gate and N-LDD mask (Lx) and length of gate (LG) on transconductance, device capacitances and operating frequency of the transistor is analyzed. Next, they are fine tuned to maximize large signal performance- output power, gain, and efficiency- of a common source PA circuit.
dc.description.statementofresponsibility by Rutu Patel, Om Maheshwari and Nihar Ranjan Mohapatra
dc.language.iso en_US
dc.publisher Institute of Electrical and Electronics Engineers (IEEE)
dc.subject LDMOS transistor
dc.subject Power amplifier
dc.subject RF
dc.title Device design of step field plate RF LDMOS transistor for improved power amplifier applications
dc.type Conference Paper


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