Dynamics, design, and application of a silicon-on-insulator technology based neuron

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dc.contributor.author Dutta, Sangya
dc.contributor.author Chavan, Tanmay
dc.contributor.author Shukla, S.
dc.contributor.author Kumar, V.
dc.contributor.author Shukla, A.
dc.contributor.author Mohapatra, Nihar Ranjan
dc.contributor.author Ganguly, Udayan
dc.date.accessioned 2018-06-19T11:15:11Z
dc.date.available 2018-06-19T11:15:11Z
dc.date.issued 2018-06
dc.identifier.citation Dutta, S.; Chavan, T.; Shukla, S.; Kumar, V.; Shukla, A.; Mohapatra, Nihar and Ganguly, U., “Dynamics, design, and application of a silicon-on-insulator technology based neuron”, MRS Advances, DOI: 10.1557/adv.2018.490, Jun. 2018. en_US
dc.identifier.issn 2059-8521
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/3750
dc.identifier.uri https://dx.doi.org/10.1557/adv.2018.490
dc.description.abstract Spiking Neural Networks propose to mimic nature’s way of recognizing patterns and making decisions in a fuzzy manner. To develop such networks in hardware, a highly manufacturable technology is required. We have proposed a silicon-based leaky integrate and fire (LIF) neuron, on a sufficiently matured 32 nm CMOS silicon-on-insulator (SOI) technology. The floating body effect of the partially depleted (PD) SOI transistor is used to store “holes” generated by impact ionization in the floating body, which performs the “integrate” function. Recombination or equivalent hole loss mimics the “leak” functions. The “hole” storage reduces the source barrier to increase the transistor current. Upon reaching a threshold current level, an external circuit records a “firing” event and resets the SOI MOSFET by draining all the stored holes. In terms of application, the neuron is able to show classification problems with reasonable accuracy. We looked at the effect of scaling experimentally. Channel length scaling reduces voltage for impact ionization and enables sharper impact ionization producing significant designability of the neuron. A circuit equivalence is also demonstrated to understand the dynamics qualitatively. Three distinct regimes are observed during integration based on different hole leakage mechanism. en_US
dc.description.statementofresponsibility by S. Dutta, T. Chavan, S. Shukla, V. Kumar, A. Shukla, Nihar R. Mohapatra and U. Ganguly
dc.language.iso en en_US
dc.publisher Cambridge University Press en_US
dc.title Dynamics, design, and application of a silicon-on-insulator technology based neuron en_US
dc.type Article en_US
dc.relation.journal MRS Advances


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