| dc.contributor.author |
Kumar, Pardeep |
|
| dc.contributor.author |
Srinivasan, Babji |
|
| dc.contributor.author |
Mohapatra, Nihar Ranjan |
|
| dc.date.accessioned |
2018-10-04T12:52:44Z |
|
| dc.date.available |
2018-10-04T12:52:44Z |
|
| dc.date.issued |
2018-09 |
|
| dc.identifier.citation |
Kumar, Pardeep; Srinivasan, Babji and Mohapatra, Nihar, "Sample plan selection techniques for Lithography process model building", Journal of Micro/Nanolithography, MEMS, and MOEMS, Sep. 2018. |
en_US |
| dc.identifier.issn |
0004-6361 |
|
| dc.identifier.issn |
1432-0746 |
|
| dc.identifier.uri |
https://doi.org/10.1117/1.JMM.17.2.023503 |
|
| dc.identifier.uri |
https://repository.iitgn.ac.in/handle/123456789/3933 |
|
| dc.description.abstract |
Kumar, Pardeep; Srinivasan, Babji and Mohapatra, Nihar, "Sample plan selection techniques for Lithography process model building", Journal of Micro/Nanolithography, MEMS, and MOEMS, Sep. 2018. |
|
| dc.description.statementofresponsibility |
by Pardeep Kumar, Babji Srinivasan and Nihar R. Mohapatra |
|
| dc.language.iso |
en |
en_US |
| dc.publisher |
Society of Photo-optical Instrumentation Engineers |
en_US |
| dc.subject |
Calibration |
en_US |
| dc.subject |
Data modeling |
en_US |
| dc.subject |
Process modeling |
en_US |
| dc.subject |
Autoregressive models |
en_US |
| dc.subject |
Lithography |
en_US |
| dc.subject |
Photomasks |
en_US |
| dc.subject |
Monte Carlo methods |
en_US |
| dc.title |
Sample plan selection techniques for Lithography process model building |
en_US |
| dc.type |
Article |
en_US |
| dc.relation.journal |
Journal of Micro/Nanolithography, MEMS, and MOEMS |
|