Epitaxial growth of FCC metals on various crystallographic surfaces of NaCl

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dc.contributor.author Dish, Nilabh
dc.contributor.author Satyaprasad, A.
dc.contributor.author Gautam, Abhay Raj Singh
dc.coverage.spatial United Kingdom
dc.date.accessioned 2012-09-29T14:45:08Z
dc.date.available 2012-09-29T14:45:08Z
dc.date.issued 2021-08
dc.identifier.citation Dish, Nilabh; Satyaprasad, A. and Gautam, Abhay Raj Singh, "Epitaxial growth of FCC metals on various crystallographic surfaces of NaCl", Microscopy and Microanalysis, DOI: 10.1017/S1431927621011727, vol. 27, pp. 3412-3413, Aug. 2021. en_US
dc.identifier.issn 1431-9276
dc.identifier.issn 1435-8115
dc.identifier.uri https://doi.org/10.1017/S1431927621011727
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/6777
dc.description.abstract Interest in epitaxially grown thin films has seen an exponential growth over the decades due to their significant scientific and technological impact. Techniques combining various substrates and vapor deposition techniques have been used to grow a range of crystallographically oriented thin films. One of the earlier approaches involved the use of freshly cleaved (100) surface of a single crystal NaCl to grow (100) oriented films of various metals through physical vapor deposition process. This offers a very efficient and convenient method of producing free-standing, oriented single-crystal metal films.
dc.description.statementofresponsibility by Nilabh Dish, A. Satyaprasad and Abhay Gautam
dc.format.extent vol. 27, pp. 3412-3413
dc.language.iso en_US en_US
dc.publisher Cambridge University Press en_US
dc.title Epitaxial growth of FCC metals on various crystallographic surfaces of NaCl en_US
dc.type Article en_US
dc.relation.journal Microscopy and Microanalysis


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