Microstructure-induced functionality in titanium dioxide thin films

Abstract

This study focuses on quantifying the microstructure-induced functionality variation in titanium dioxide films owing to minor changes in their process conditions. To this end, thin titanium dioxide films are deposited by varying the target composition as well as the working environment in sputtering. A series of characterization techniques are then used to provide a quantitative account on the development of the phase, chemical constitution, composition, thickness, roughness, density, etc. for these films, which are further linked to their electronic structure, electrical, optical, and surface characteristics. Insights developed through this study would help in allowing the tolerance range in the experimental design for fabricating films with desirable functionalities.