| dc.contributor.author |
Kaur, Ramandeep |
|
| dc.contributor.author |
Mohapatra, Nihar Ranjan |
|
| dc.contributor.other |
7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM 2023) |
|
| dc.coverage.spatial |
Seoul, KR |
|
| dc.date.accessioned |
2023-05-17T08:16:06Z |
|
| dc.date.available |
2023-05-17T08:16:06Z |
|
| dc.date.issued |
2023-03-07 |
|
| dc.identifier.citation |
Kaur, Ramandeep and Mohapatra, Nihar Ranjan, "Process-induced uniaxial strain in Nanosheet-FET based CMOS technology-is it still beneficial?", in the 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM 2023), Seoul, KR, Mar. 7-10, 2023. |
|
| dc.identifier.uri |
https://repository.iitgn.ac.in/handle/123456789/8822 |
|
| dc.description.statementofresponsibility |
by Ramandeep Kaur and Nihar Ranjan Mohapatra |
|
| dc.language.iso |
en_US |
|
| dc.title |
Process-induced uniaxial strain in Nanosheet-FET based CMOS technology-is it still beneficial? |
|
| dc.type |
Conference Paper |
|